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Plasma deposition of amorphous silicon-based materials [electronic resource] / edited by Giovanni Bruno, Pio Capezzuto, Arun Madan.

Contributor(s): Bruno, Giovanni | Capezzuto, Pio | Madan, A. (Arun).
Material type: TextTextSeries: Plasma--materials interactions: Publisher: Boston : Academic Press, c1995Description: 1 online resource (xi, 324 p.) : ill.ISBN: 9780080539102 (electronic bk.); 0080539106 (electronic bk.).Subject(s): Amorphous semiconductors -- Design and construction | Silicon alloys | Plasma-enhanced chemical vapor deposition | TECHNOLOGY & ENGINEERING -- Electronics -- Solid State | TECHNOLOGY & ENGINEERING -- Electronics -- Semiconductors | SemiconductorsGenre/Form: Electronic books.Additional physical formats: Print version:: Plasma deposition of amorphous silicon-based materials.DDC classification: 621.3815/2 Online resources: EBSCOhost
Contents:
Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices
Summary: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.
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Includes bibliographical references and index.

Description based on print version record.

Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices

Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.

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Plasma deposition of amorphous silicon-based materials ©1995
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